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Sophisticated Transparent Conducting Film Magnetron Sputtering Machine

Sophisticated Transparent Conducting Film Magnetron Sputtering Machine

Designed to meet the demanding needs of industries requiring high-quality TCO layers, SIMVACO advanced TCO sputtering machine delivers exceptional film uniformity, low electrical resistance, and high optical transparency, making it ideal for applications in touchscreens, flat panel displays, Solar Energy, and energy-efficient glass

Key Features:

  • Advanced Sputtering Technology: Employing state-of-the-art DC and RF sputtering systems, our machine ensures highly efficient deposition of transparent conductive oxide layers on various substrates.
  • Uniform Coating: Automated and precise control over deposition parameters, including power, pressure, and gas flow, guarantees uniform thickness and consistent film quality across all surfaces.
  • High Throughput: Optimized for continuous production, the system offers rapid coating times without compromising on quality, making it ideal for large-scale manufacturing needs.
  • Enhanced Control Systems: Equipped with advanced PLC control and touch-screen interface, operators can easily adjust parameters and monitor the sputtering process for optimal results.
  • Energy-Efficient Design: Designed with energy efficiency in mind, our sputter coating machine reduces operational costs while ensuring high-performance outcomes, resulting in significant savings for manufacturers.
  • Durability and Reliability: Built to last, this machine features durable components and a robust vacuum system, ensuring long-term reliability and minimal maintenance downtime.

Applications:

  • Transparent Conductive Films: For the production of high-quality ITO coatings used in touchscreens, displays, and photovoltaic cells.
  • Electronics: Coatings for electronic devices requiring transparent conductive layers.
  • Photovoltaics: Deposition of conductive layers for solar cell applications.
  • Optoelectronics: Thin films for LEDs, OLEDs, and other optoelectronic devices.
  • Flexible Displays: Coatings on flexible substrates for next-generation display technologies.

Technical Specifications

Specification Details
Sputtering Method DC & RF Magnetron Sputtering
Substrate Size Up to 1200 mm x 1000 mm
Deposition Rate Up to 0.5 µm/min (depending on material and substrate)
Target Materials ITO, ZnO, SnO2, and other transparent conductive oxides
Power Supply 3-phase, 380V, 50/60Hz
Substrate Heating Up to 500°C for optimal film adhesion
Control System PLC with HMI for easy process control
Process Gases Ar, O2, and other reactive gases for precise film composition
Production Capacity Up to 500 units/day
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