Laboratory Thin-Film Deposition for Material Testing PVD Coating Machine
Laboratory Thin-Film Deposition for Material Testing PVD Coating Machine
Our Laboratory PVD Coating Equipment is a vital tool for precise thin-film deposition and material testing. With its robust technical specifications and versatile applications, it is the ideal solution for research institutions seeking reliable and efficient coating solutions.
Key Features
- Versatile PVD Techniques: Supports multiple deposition processes, including magnetron sputtering and thermal evaporation for thin-film coating versatility.
- High Deposition Precision: Achieves film thickness control with accuracy down to ±3% for consistent performance.
- Compact and Efficient: Laboratory-optimized chamber size of 300×350×500 mm, ensuring space efficiency without compromising functionality.
- Advanced Process Monitoring: Real-time monitoring of vacuum pressure, deposition rate, and film thickness ensures stable and repeatable results.
- Substrate Heating: Adjustable heating up to 300°C improves film adhesion and enhances coating quality.
- Material Compatibility: Supports metals, alloys, oxides, nitrides, and other materials for research and testing needs.
Technical Specifications
| Parameter | Specification |
|---|---|
| Deposition Technology | PVD: Magnetron Sputtering / Thermal |
| Chamber Size | 300×350×500 mm |
| Vacuum Pressure | ≤1×10⁻⁴ Pa |
| Film Thickness Range | 10nm - 5μm |
| Coating Uniformity | ±3% |
| Deposition Rate | Up to 2nm/s |
| Substrate Heating | Up to 300°C |
| Material Options | Metals, Oxides, Nitrides, Alloys |
| Operation | Manual or Semi-Automated |
Applications
- Advanced Materials Research: Thin-film deposition for experimental material studies.
- Optical Coatings: Development of anti-reflective, reflective, and protective thin films.
- Semiconductor Prototyping: Precise deposition for microelectronics, MEMS, and sensor applications.
- Material Testing: Small-batch thin-film development and verification for new technologies.
System Advantages
- Precision Deposition: Accurate control over film thickness and uniformity for reliable results.
- Multi-Process Flexibility: Supports various PVD methods for diverse thin-film applications.
- Compact Design: Optimized for laboratory use, saving space while ensuring maximum efficiency.
- Process Stability: Real-time diagnostics enable repeatable, high-quality thin-film coatings.
- Wide Material Range: Works with different materials for research and prototyping purposes.
The laboratory PVD coating equipment offers a versatile and reliable solution for thin-film deposition and material testing in R&D environments. It is ideal for universities, research centers, and laboratories focused on next-generation material and coating technologies. For more information or to request a demonstration, please contact us today
